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High-responsivity low-voltage 28-Gb/s Ge p-i-n photodetector with silicon contacts

机译:具有硅触点的高响应度低压28-Gb / s Ge p-i-n光电探测器

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摘要

We report a high-performance germanium waveguide photodetectors (WPDs) without doping in germanium or direct metal contacts on germanium, grown on and contacted through a silicon p-i-n diode structure. Wafer-scale measurements demonstrate high responsivities larger than 1.0 A/W across the C-band and low dark current of similar to 3 nA at -1 V and similar to 8 nA at -2 V. Owing to its small dimensions, the Ge WPD exhibits a high optoelectrical 3-dB bandwidth of 20 and 27 GHz at low-bias voltages of -1 and -2 V, respectively, which are sufficient for operation at 28 Gb/s. The reduced processing complexity at the tungsten contact plug module combined with the high responsivity makes these Ge WPD devices particularly attractive for emerging low-cost CMOS-Si photonics transceivers
机译:我们报告了一种高性能的锗波导光电探测器(WPD),它没有掺杂锗或锗上的直接金属触点,而是在硅p-i-n二极管结构上生长并通过其接触。晶圆级测量表明,C波段的响应度大于1.0 A / W,低暗电流在-1 V时约为3 nA,在-2 V时约为8 nA。由于其尺寸小,Ge WPD分别在-1和-2 V的低偏置电压下具有20 GHz和27 GHz的高光电3-dB带宽,足以在28 Gb / s的速度下工作。钨触点插头模块的降低的处理复杂性以及高响应性使这些Ge WPD器件特别适合新兴的低成本CMOS-Si光子收发器

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